发明名称 THIN FILM FORMING DEVICE
摘要 PURPOSE:To provide a titled device capable of forming a uniform and good-quality film at high speed with a simple mechanism by impressing a revolving magnetic field vertical to an ion particle stream, and rotating the position at the maximum reach of the ionic flow rate. CONSTITUTION:An ion particle stream generated from an ion gun 2 is passed through an aperture 4 and made into an axisymmetrical and Gaussian distribution beam in a vacuum vessel 1 filled with an Ar atmosphere, and a revolving magnetic field is further impressed by a coil 5. The beam is struck against the surface of a substrate 3 in the form of a shower to form a thin film on the surface. The peak position of the Gaussian distribution having the highest concn. of ions of the ionic stream is synchronized with the revolving magnetic field by said revolving magnetic field impressing means, oscillated, and struck concentrically against the surface of the substrate 3. By said method, the homogeneous thin film free from foreign matter can be efficiently formed on the substrate 3 without depending on a mechanical rotating mechanism or the like.
申请公布号 JPS6082661(A) 申请公布日期 1985.05.10
申请号 JP19830188397 申请日期 1983.10.11
申请人 HITACHI SEISAKUSHO KK 发明人 KAIZUKA TAKANORI;TAKADA MASANORI
分类号 C23F4/00;C23C14/22;C23C14/32;C23C14/48 主分类号 C23F4/00
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