| 摘要 |
PURPOSE:To prevent any accidental mis-discharge by providing an insulating layer of a specific thickness on the writing electrode. CONSTITUTION:An insulating layer 11 is prepared from MgO or similar material and has a thickness of 1mum or below (e.g., 0.5mum). It is formed by a thin film formation technique such as electron beam vapordeposition. Each of a writing electrode 5 and a pair of discharge maintenance electrodes 2 and 3 has a three- layered structure consisting of thin chromium, copper and chromium layers. A dielectric layer 4 is formed by a low melting glass principally composed of lead oxide. Electric charges once accumulated in the surface of an insulating layer facing the writing electrode 5 by writing discharge or maintenance discharge, easily leak into the writing electrode 5 through pin-holes existing in the insulating layer. Accordingly, no electric charges are accumulated in the insulating layer facing the writing electrode 5, thereby preventing any induction of mis- discharge. |
