| 摘要 |
A coating (3) is deposited on a substrate (1) of a cutting tool and contains a refractory metal compound of the group of C, N, O, B, Si elements with microcrystals incorporated therein, which compound is produced by heating by means of metal ion bombardment with the simultaneous inlet of a gas reagent containing the elements from the group of C, N, B, O, Si. The heating is effected up to a temperature, which is 100<o>C less than the temperature at which the loss of strength of the substrate takes place, and which is maintained in the range from said temperature to +50<o>C. A pressure of the gas reagent is adjusted simultaneously in the range of 13.33 to 13.33 x 10<-2>Pa. A maximum number of the microcrystals have such an orientation that the same crystallographic plane (4) thereof is parallel to the substrate (1). |
