| 摘要 |
PURPOSE:To obtain an X-ray resist high in sensitivity to X-rays and resistance to dry etching, and capable of forming a fine resist pattern by using the resist composed essentially of a polymer having specified repeating structural units. CONSTITUTION:The X-ray resist is composed essentially of the polymer having repeating structural units represented by the formula shown on the right in which each of R<1> and R<2>, optionally same or different, is optionally substd. 1-4 C alkyl, 3-8 C cycloalkyl, 6-12 C aryl, alkaryl, or aralkyl. The polymer is, preferably, composed of said units, alone, but when other structural units are contained, the units of the formula are, preferably, in an amt. of <=50wt%, and it is preferred for the polymer to have a weight average mol.wt. of 3,000-2,000,000 in terms of the polystyrene, though it is not especially limited. This X-ray resist is usually prepared by dissolving this polymer of the formula as the essential component in a proper solvent. |
