| 摘要 |
PURPOSE:To obtain a titled head having reduced magnetostriction and high output by incorporating specified wt% each of Al and Si into a metallic magnetic film. CONSTITUTION:Nonmagnetic substrates 1 and 1' having specified thermal expansion coefficients are provided, and a metallic magnetic film 2 contg. 5.5+ or -1.0wt% Al and 9.5+ or -1.0wt% Si is formed on the substrate 1by sputtering. In addition, SiO2 is sputtered to form a film 3, and a metallic magnetic film 2', an SiO2 film 3', and a metallic magnetic film 2'' are successively formed. Then a glass film 4 is formed on the metallic magnetic film 2'' by sputtering low-melting point lead glass. Similar low-melting point glass film 4 is formed on the other substrate 1'. Both substrates 1 and 1' thus obtained are welded and butted with the glass film 4 to form a core body 7. Then the body 7 is cut of a specified azimuth angle to obtain core half bodies 6 and 6 whose cut surfaces are lapped, sputtered with gap spacers 5 and 5', heated and bonded to obtain the metallic magnetic thin film head. |
