| 摘要 |
A process is described for fabricating spacers of a desired thickness of filters, the spacers to be used in separating the filter from an underlying image sensing device. The process includes the steps of forming a pattern of electrically conductive material on one surface of the filter, depositing dry resist to the desired thickness over all of the filter except on the electrically conductive pattern, depositing additional electrically conductive material on at least the electrically conductive pattern, and removing the dry resist.
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