发明名称 Pattern alignment system and method
摘要 A pattern recognition system for providing automatic alignment capability for a semiconductor wafer or other object. The system includes an integrator for electronically smearing input data representing the reflected light level of a scanned object, means for digitizing the smeared data, and processor means for determining the best match between the smeared, digitized data and predetermined stored data, thereby representing proper alignment of the wafer or other object.
申请公布号 US4515480(A) 申请公布日期 1985.05.07
申请号 US19820366368 申请日期 1982.04.07
申请人 MICRO AUTOMATION, INC. 发明人 MILLER, WILLIAM I.;REIMILLER, ROBERT D.
分类号 G03F9/00;G06K9/32;(IPC1-7):G01B11/00 主分类号 G03F9/00
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