发明名称 |
METHOD FOR UNDERCOATING FILM FOR PHOTOSENSITIVE MATERIAL |
摘要 |
PURPOSE:To form directly a hydrophilic colloidal layer on the surface of a film by mixing an aqueous dispersion of a copolymer consisting of a specified amount of styrene and/or a styrene deriv. and a specified amount of an acrylate with a compound having two or more epoxy groups in one molecule to prepare a coating liq. and by coating the liq. on the surface of the film. CONSTITUTION:An aqueous dispersion of a copolymer consisting of 100-60wt% styrene and/or styrene deriv. respresented by the formula (where R is H or alkyl) and an acrylate represented by a formula CH2=CH2R (where R is alkyl) is mixed with a compound having two or more epoxy groups in one molecule to prepare a coating liq. This coating liq. is coated on a film support for a photosensitive material. The amount of the acrylate can be arbitrarily selected within the range of 10-60wt% styrene and/or styrene deriv. content, yet the desired amount is 20-50wt%. The kind of the acrylate can be arbitrarily selected. |
申请公布号 |
JPS6079350(A) |
申请公布日期 |
1985.05.07 |
申请号 |
JP19830183731 |
申请日期 |
1983.10.01 |
申请人 |
MITSUBISHI SEISHI KK |
发明人 |
SAKATA TOSHIHIKO;IWANAGA KATSUAKI |
分类号 |
B05D5/00;C08J7/04;G03C1/91;G03C1/93 |
主分类号 |
B05D5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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