发明名称 CONTINUOUS PROCESSING DEVICE OF SEMICONDUCTOR SUBSTRATE
摘要 PURPOSE:To improve the operation efficiency of a device by a method wherein a process requirement is called up from memory per processing stage to perform the process continuously if the process requirement of a lot in process and that of a lot for the next process are similar to each other. CONSTITUTION:A semiconductor substrate placed on the specified position from a loader 1 is shifted to the first processing stage 2-1, the second processing stage 2-2, the Nth processing stage 2-N by means of conveyors etc. to bedischarged from an unloader 3. Each stage is provided with respective device for various processes to be controlled by a controller 4 equipped with a memory 4a. When the processing stages are charged with the lots, the lots may be continuously processed without resetting a new process requirement.
申请公布号 JPS6079731(A) 申请公布日期 1985.05.07
申请号 JP19830187435 申请日期 1983.10.06
申请人 TOSHIBA KK 发明人 KODAMA SHIYOUICHI
分类号 H01L21/50;(IPC1-7):H01L21/50 主分类号 H01L21/50
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