发明名称 A semiconductor integrated circuit device comprising an MOS transistor and a bipolar transistor and a manufacturing method of the same.
摘要 <p>A semiconductor integrated circuit device is disclosed which comprises a bipolar transistor and a field effect transistor, in which a gate electrode (38, 39) of the field effect transistor and a collector electrode (402) of the bipolar transistor are formed from a common electrode layer (102) of a high impurity concentration, and in which the collector region (242) of the bipolar transistor comprises a region (100) of a high impurity concentration having a conductivity type the same as that of the collector region (242) of the bipolar transistor.</p>
申请公布号 EP0139266(A2) 申请公布日期 1985.05.02
申请号 EP19840111849 申请日期 1984.10.03
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 IWASAKI, HIROSHI C/O PATENT DIVISION
分类号 H01L21/76;H01L21/225;H01L21/331;H01L21/8249;H01L27/06;H01L29/73;H01L29/732;(IPC1-7):H01L27/06;H01L21/82 主分类号 H01L21/76
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