发明名称 |
A semiconductor integrated circuit device comprising an MOS transistor and a bipolar transistor and a manufacturing method of the same. |
摘要 |
<p>A semiconductor integrated circuit device is disclosed which comprises a bipolar transistor and a field effect transistor, in which a gate electrode (38, 39) of the field effect transistor and a collector electrode (402) of the bipolar transistor are formed from a common electrode layer (102) of a high impurity concentration, and in which the collector region (242) of the bipolar transistor comprises a region (100) of a high impurity concentration having a conductivity type the same as that of the collector region (242) of the bipolar transistor.</p> |
申请公布号 |
EP0139266(A2) |
申请公布日期 |
1985.05.02 |
申请号 |
EP19840111849 |
申请日期 |
1984.10.03 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
IWASAKI, HIROSHI C/O PATENT DIVISION |
分类号 |
H01L21/76;H01L21/225;H01L21/331;H01L21/8249;H01L27/06;H01L29/73;H01L29/732;(IPC1-7):H01L27/06;H01L21/82 |
主分类号 |
H01L21/76 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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