| 摘要 |
Trichlorosilane is prepd. by reacting a mixt. of SiCl4 and H2 in the ratio 1:1-3 (pref. 1:1.5-2) in the presence of an agent which removes HCl. The reaction occurs at 700-1400 degrees C, pref. 900-1100 degrees C, opt. in the presence of a reducing agent. Spec. reaction is effect in the presence of Si or a metal contng. Si. High yields are obtained e.g. 20-30% based on SiCl4. |
