| 摘要 |
PURPOSE:To obtain an optical branching waveguide with high accuracy and less branching loss by dividing a mask pattern (MP) to plural MPs so as not to contain a branch part and a crossing part, placing successively the divided MPs on a base plate, irradiating UV light thereto and forming the optical waveguide meeting the shape of the MP. CONSTITUTION:Mask patterns (MP) 7, 11 including a branch part 12 or crossing part 8 are irradiated with UV light from above and the part which is not exposed by the MP is etched to manufacture an optical branching waveguide meeting the shape of the MP. The MP in this stage is divided to plural, for example, MPs 7, 9 or MPs 13, 14 so as not to include the branch part 12 and the crossing part 8 and the divided MPs 7, 9, 13, 14 are successively placed on the base plate for exposure and are exposed with UV light to manufacture the optical waveguide meeting the shape of the MP. The mask is divided and is exposed to manufacture the waveguide in the above-mentioned way, by which the photographic fog in the narrow part is decreased, the accuracy is improved and the branching loss is decreased. |
