| 摘要 |
PURPOSE:To obtain the high effect of washing in a short time by a method wherein a carrier holding plate having a plurality of through holes is provided at the bottom of a water washing bath, and the carrier with many semiconductor wafers errected in an array at intervals is mounted thereon; when the wafers are washed by pouring washing water from a water supply port provided at the bottom of the bath, a water supply pipe having spouting nozzles is additionally inserted between respective wafers. CONSTITUTION:The carrier holding plate 4 having a plurality of the through holes 6 is installed to the inner bottom wall 1a of the water washing bath 1 having the water supply port 5 through which the washing water is fed to the bottom, and the carrier 3 opened in the upper and lower parts is arranged thereon. This carrier 3 is kept provided with a plurality of housing grooves 3 opposed to one another at the same intervals, where semiconductor wafers 2 are errected in an array by insertion, respectively. In this construction, the underwater spouting nozzles 8 provided with many spouting ports 8a at the tip are inserted between respective wafers 2, and the water supply pipe 7 freely attached and removed is then connected to them. Washing power is strengthened in such a manner, and the overflowing water can also be used by circulation. |
