发明名称 CARBONYLMETHYLENE-HETEROCYCLIC COMPOUNDS CONTAINING TRIHALOGENO-METHYL GROUPS,PROCESS FOR THEIR PREPARATION,AND LIGHT-SENSITIVE MIXTURE CONTAINING THE COMPOUNDS
摘要 Compounds of the formula I …<IMAGE>… are described in which L denotes H or CO-(R<1>)n(CX3)m, M denotes alkylene, alkenylene or arylene, Q denotes S, Se, O, dialkylmethylene, alken-1,2-ylene, 1,2-phenylene or N-R, where M + Q together form 3 or 4 ring members, R denotes alkyl, aralkyl or alkoxyalkyl, R<1> denotes an aromatic group, and X denotes Cl, Br or I and n = 0 and m = 1 or n = 1 and m = 1 or 2. The compounds eliminate HX on irradiation and form radicals. They are therefore highly active acid donors and radical initiators for photochemical processes.
申请公布号 ZA8407165(B) 申请公布日期 1985.04.24
申请号 ZA19840007165 申请日期 1984.09.12
申请人 HOECHST AKTIENGESELLSCHAFT 发明人 REINHARD DOENGES;HANS RUCKERT;ULRICH GEISSLER;HARTMUT STEPPAN
分类号 C07D277/20;C07D209/12;C07D215/10;C07D215/12;C07D215/14;C07D277/12;C07D277/64;C07D277/84;C07D293/00;C07D293/12;C07D521/00;C08F2/00;C08F2/50;C08G85/00;G03C1/00;G03C1/675;G03F7/029 主分类号 C07D277/20
代理机构 代理人
主权项
地址