发明名称 POST-EXPOSURE PROCESS
摘要 Disclosed is the improvement in post-exposing relief printing plates prepared from photosensitive polymeric compositions which comprises immersing the relief printing plate in a dilute aqueous solution of a persulfate salt and a sufficient amount of a water-soluble carboxylic acid to provide a pH of about 1.5 to about 2.5 during exposure to actinic radiation.
申请公布号 ZA8306151(B) 申请公布日期 1985.04.24
申请号 ZA19830006151 申请日期 1983.08.19
申请人 HERCULES INCORPORATED 发明人 RUDOLPH LEROY PHOL
分类号 G03F7/20 主分类号 G03F7/20
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