发明名称 PHOTO-CROSSLINKABLE PRESSURE-SENSITIVE ADHESIVE COMPOSITION
摘要 <p>PURPOSE:The titled composition having improved adhesion and water resistance free from an organic solvent, comprising a hydrosol composition obtained by adding an alkali and water to a mixture consisting of a photo-crosslinkable copolymer prepared from a specific acrylic copolymer and a sensitizer. CONSTITUTION:The desired composition comprising a hydrosol composition having 0.01-0.1mu average particle diameter, obtained by adding an alkali and water to a mixture of a photo-crosslinkable copolymer obtained by reacting (A) an acrylic copolymer having 1X10<4>-1X10<6> weight-average molecular weight having (i) 98-50wt% main monomer containing (meth)acrylic acid ester as a main component, and (ii) 2-20wt% copolymerizable unsaturated monomer with an acidic group of carboxyl group or sulfonic group, with (B) a compound containing a functional group and (meth)acryloyl group to be reacted with the active group and an active hydrogen in such a way that the acidic group in the component A remains after the reaction, and a photosensitizer.</p>
申请公布号 JPS6071677(A) 申请公布日期 1985.04.23
申请号 JP19830181652 申请日期 1983.09.28
申请人 NITTO DENKI KOGYO KK 发明人 SHIBATA YUKARI;WADA SHINTAROU;YAMADA SHINJI;MATSUMOTO KENJI
分类号 C09J7/02;C08F290/00;C08F299/00;C09D11/00;C09D11/16;C09J4/00 主分类号 C09J7/02
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