发明名称 SEMICONDUCTOR DEVICE
摘要 PURPOSE:To obtain stability for a prolonged term regarding reverse leakage current characteristics by forming an annular aluminum film to the predetermined surface of a Pb group gas film while being separated from a P-N junction and surrounding the P-N junction. CONSTITUTION:An anode contact window is bored, Al is evaporated, and an annular aluminum film 12 is formed together with an anode electrode 5 through selective etching by a photographic process. The whole is sintered in a nitrogen atmosphere in order to obtain an ohmic contact between the anode electrode 5 and a P+ diffusion layer 2. Glass 3b under the Al film 12 during a sintering process has some quantity of positive charges (+) though glass 3a in a section in which there is no Al film 12 has a large quantity of negative currents (-). Consequently, an inversion layer 9 is stopped only under the glass film 3a. Accordingly, an initial contact with a channel stopper layer 4 of the inversion layer 9 is prevented, and leakage currents are controlled.
申请公布号 JPS6070761(A) 申请公布日期 1985.04.22
申请号 JP19830178426 申请日期 1983.09.27
申请人 SHINDENGEN KOGYO KK 发明人 TSUNOISHI CHIHARU
分类号 H01L21/316;H01L29/06;H01L29/40 主分类号 H01L21/316
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