发明名称 FORMATION OF MASK FOR X-RAY LITHOGRAPHY
摘要 PURPOSE:To enable easy and quick sepn. and to make its process simpler and faster in the stage of transferring a mask film body to a holding body by acting an ultrasonic wave to separate a flat plate and the mask film body. CONSTITUTION:An X-ray transmission layer 2 consisting of a high polymer film of polyimide, etc., an X-ray absorbing layer 3 of a mask pattern consisting of gold, platinum, etc. and an X-ray transmission layer 4 similar to the layer 2 are successively laminated on a flat plate 1 consisting of an Si wafer or the like provided with an oxide layer on the surface thereby manufacturing a mask film body 5. A holding body 6 is for mask of a toric shape and is formed of, for example, quartz, glass, etc. An adhesive agent is uniformly coated on the body 6 and the inverted plate 1 and the body 5 are placed and adhered thereto. The holding body 6, the film body 5 and the flat plate 1 which are joined upon curing of the adhesive agent are put into a solvent and an ultrasonic wave is acted thereon to separate the plate 1. Water, a polar solvent such as alcohol, ketone or the like and others are preferable for the solvent.
申请公布号 JPS6068337(A) 申请公布日期 1985.04.18
申请号 JP19830177289 申请日期 1983.09.26
申请人 CANON KK 发明人 KATOU HIDEO
分类号 G03F1/00;G03F1/22;G03F1/68;H01L21/027 主分类号 G03F1/00
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