发明名称 STRUCTURAL BODY OF MASK FOR LITHOGRAPHY
摘要 PURPOSE:To transmit immediately the heat generated by a mask material during working to a heat conductive holding base plate and to enable prevention of deterioration owing to local evolution of heat by bringing the heat conductive layer of a thin film for holding the mask material into contact with said base plate. CONSTITUTION:A mask material 1 is formed in a desired pattern to the inside of a holding thin film 2. The film 2 contains a heat-conductive layer 2a and the mask material 1 is positioned in contact with the layer 2a. The periphery of the film 2 is adhered to a toric holding base plate 3. The plate 3 consists of metals such as iron, cobalt, nickel, tungsten, molybdenum, etc. or the alloy thereof and is so formed that the plate can be attached and detached to and from a lithography device by means of a magnetic chuck. The layer 2a consists of gold, silver, copper, aluminum, beryllium, tin, etc. The layer 2b allows transmission of irradiation energy and holds the material 1 together with the layer 2a. Said layer consists of boron nitride, silicon nitride, silicon oxide, etc.
申请公布号 JPS6068341(A) 申请公布日期 1985.04.18
申请号 JP19830177288 申请日期 1983.09.26
申请人 CANON KK 发明人 KATOU HIDEO
分类号 G03F1/00;G03F1/58;H01L21/027 主分类号 G03F1/00
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