| 摘要 |
<p>Exposure device for image-wise exposure dot by dot along a line, of a movable light-sensitive layer (21) to a laser (10), in which a slit (19) is disposed near the light-sensitive layer (21), the slit width (18) being less than the dimension of the laserbeam (14,17) as considered in the direction of slit width at the slit.
<??>By using a narrow slit of this kind, it is attained by the use of simple means that the laserbeam always describes at least one and the same line, also when run-out occurs. </p> |
