| 摘要 |
<p>PURPOSE:To make mass production of a color filter having high accuracy by laminating successively negative type resists having different concn. of photosensitive agents in order to smooth the ruggedness on the surface of an element base plate prior to a stage for providing a coloring layer on the element base plate. CONSTITUTION:A resist for smoothing (high photosensitivity-base density) 17 is first formed on a solid-state element base plate 10 and in succession, the low sensitivity-base density resist 17' is provided thereof. Lamination of additional one layer of low-density resist is also possible when needed in order to attain higher smoothness. If the layers 17, 17' are simultaneously irradiated and exposed at the same exposure, the remaining crosslinking film corresponding to the exposure characteristic thereof is formed and the flatness is considerably improved. If cyan and yellow layers are formed on the flattened layer, the filter is not affected at all by the step and ruggedness of the underlying layers and therefore the filter picture element having an extremely uniform film thickness and dyeability is formed.</p> |
