| 摘要 |
A silver halide photographic light-sensitive material comprised of a support base having thereon a silver halide emulsion layer and an antistatic layer. The antistatic layer contains a nonionic surface active agent having two polyoxyethylene chains in a molecule, the agent being represented by the formula (I): <IMAGE> (I) wherein R1 and R3 each represents a substituted or non-substituted alkyl, aryl, alkoxy, aryloxy, acyl, amido, sulfonamido, carbamoyl or sulfamoyl group, or a halogen atom, R2 and R4 each represents a hydrogen atom, a substituted or nonsubstituted alkyl, aryl, alkoxy, aryloxy, acyl, amido, sulfonamido, carbamoyl or sulfamoyl group, or a halogen atom, R5 and R6 each represents a hydrogen atom, or a substituted or nonsubstituted alkyl or aryl group, wherein the sum total of carbon atoms in R5 and R6 is 2 or more, or R5 and R6 may form a ring by linking with each other, and m and n independently each represents an average degree of polymerization of ethylene oxide which is 2 to 40. The antistatic layer provides a photographic material which has excellent antistatic effects without causing undesirable effects on the photographic properties of the material. The antistatic layer does not cause screen contamination and the antistatic effects do not deteriorate with the passage of time. Particularly good results are obtained with silver halide light-sensitive materials utilized with high speed processing at a high temperature especially when the materials are of high sensitivity.
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