发明名称 Formation of narrow conductive paths on a substrate
摘要 A method of forming electrically conductive paths within grooves formed in a substrate wherein the width of the grooves is of the same order of magnitude as the thickness of an electrically conductive layer deposited on the substrate and in the grooves. The substrate with grooves therein is exposed to a medium whereby electrically conductive material from the medium deposits substantially uniformly on all surfaces of the substrate which are exposed to the medium. In this way, the build-up of conductive material in grooves will take place along the side walls as well as the bottom of the grooves. If the layer is of substantially the same order of magnitude as the width of the groove (about one half the groove width or greater), the grooves will fill up with conductive material. The remainder of the substrate will ultimately provide a substantially flat conductive layer on the substrate surface. The conductive material is then removed by an action which removes exposed conductor along the entire substrate surface at a uniform rate whereby the conductor will be substantially entirely removed from the substrate except for the portion thereof within the grooves. In this way an electrically conductive path of predetermined geometry is provided.
申请公布号 US4510347(A) 申请公布日期 1985.04.09
申请号 US19820447159 申请日期 1982.12.06
申请人 FINE PARTICLES TECHNOLOGY CORPORATION 发明人 WIECH, JR., RAYMOND E.
分类号 H05K1/03;H05K1/09;H05K3/04;H05K3/06;H05K3/07;H05K3/10;H05K3/12;(IPC1-7):H05K1/02 主分类号 H05K1/03
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