| 摘要 |
In ion micro-analysis, intensity of at least one species of secondary ions is monitored, and a reference etching time required for etching an implanted depth of primary ions is determined from a profile of a secondary ion intensity signal. Analysis time is graduated on the basis of the reference etching time to represent an analysis signal with the scale of the depth. The primary ions are non-volatile and may be active ions which react with a specimen or metal ions. The analyzed depth can be found during the analysis to prevent unwanted analysis and assure rapid data processing.
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