| 摘要 |
PURPOSE:To strip easily resist with a photoengraving method using an alkali soluble type sensitizer by dipping a plate into an aq. alkali soln. to swell the plate then conducting electricity to the plate thereby generating O2 or H2 between the plate and the resist. CONSTITUTION:A plate is dipped in a resist stripping soln. consisting of an aq. alkali soln. and is thus swollen in the stage of stripping the resist from the plate after forming the resist thereon and etching the resist with a photoengraving method using an alkali-soluble type sensitizer. A soln. prepd. by mixing a surface active agent and detergent at a suitable amt. with caustic soda and dissolving about 100g such mixture in 1l water is adequately used. Electric current is then passed to the plate to generate gaseous oxygen or gaseous hydrogen between the plate and the resist and thereafter the resist is stripped. The resist is thus stripped satisfactorily in short time without damaging the non-image part and the cell. |
