| 摘要 |
PURPOSE:To enable to equally feed gas to an objective material to be treated by a method wherein a shielding member having penetrated holes is provided between mutually parallel flat plate electrodes. CONSTITUTION:An objective material 19 to be treated is placed on one side of mutually parallel flat plate electrodes 12 and 13 provided in a treating chamber 11 and the objective material 19 is treated by a gas electrochemical reaction of high-frequecy voltage, which is impressed on the electrodes 12 and 13, and gas, which is fed from a gas introducing passage 14. A shielding member 16 having penetrated holes 17 is provided between the electrodes 12 and 13 in the treating chamber 11. The gas, which is fed from the gas introducing passage 14, can be equally fed to the objective material 19 to be treated by the shielding member 16. As a result, treatments such as etching, etc., are uniformly performed. |
