发明名称 METHOD FOR ELECTRONIC BEAM DRAWING
摘要 PURPOSE:To enable VLSI having a chip area larger than the square of a deflection span to be drawn without connecting patterns, by a method in which the shorter side of the chip is defined as the deflection while the longer side being aligned with the direction of continuous movement of stages, and the deflection span is made larger than the shorter side. CONSTITUTION:The pattern data recorded on a magnetic tape designed by CAD system 70 are read by a magnetic tape unit. On the magnetic tape, chip size information is also recorded. The pattern data are converted to EB format data by the format conversion program 66. When the data are converted, the shorter side of the chip is selected so as to define the deflecting direction. The converted EB format data are stored in a magnetic disc circuit 68. With respect to the length of the shorter side of the chip, a deflection span x+alpha is set so that the span is a bit larger than x. The value of alpha will correspond to the width of a dicing line. When a deflection span is thus set and a pattern is drawn in a method as usually known, a pattern having large chip area and without connections can be obtained.
申请公布号 JPS6059732(A) 申请公布日期 1985.04.06
申请号 JP19830167444 申请日期 1983.09.13
申请人 TOSHIBA KK 发明人 TAKIGAWA TADAHIRO
分类号 G03F7/20;H01L21/027;(IPC1-7):H01L21/30 主分类号 G03F7/20
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