| 摘要 |
Pulses through a coil in a magnetic field move the coil back and forth and cause an engagement arrangement to execute successive roundtrip movements that advance a focus control along one step for each pulse. According to an embodiment of the invention, the inertia of an exposure control is too great to follow the back and forth motion of the coil in response to these focusing pulses. However, longer exposure control pulses allow the exposure control to follow the coil motion.
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