发明名称 DEVICE FOR EXPOSING TO ELECTRONIC BEAM
摘要 PURPOSE:To obtain higher throughput by providing a turn table for supporting and shifting samples to be drawn whose rotation is combined with the linear movement of the center of its rotation. CONSTITUTION:Electron beams 4 focussed by electronic lenses 5 and 6 scan over samples 2 to be drawn, in cooperation with a deflecting power source 11, a deflecting coil 8 and a deflecting plate 9. At the same time, the elctron beams 4 are turned ON and OFF by a blanking plate 7 operated by the signals from the power source 10. A large number of samples 2 set on the circumference of a turn table 1 are drawn only in the width of electrostatic deflection 14 during one rotatin of the turn table 1 in the direction R. During another rotation, the turn table 1 is slightly shifted in the direction X by the width of the electrostatic deflection 14. Thus, the drawn region of the sample proceeds from 12 to 13 as the turn table 1 rotates. In such a manner, the samples can be shifted finitely and smoothly without any intermittent actions, and moreover, several tens of samples can be drawm at the same time.
申请公布号 JPS6055621(A) 申请公布日期 1985.03.30
申请号 JP19830163133 申请日期 1983.09.07
申请人 HITACHI SEISAKUSHO KK 发明人 HOKOTANI YOSHIO
分类号 G03F7/20;H01L21/027;(IPC1-7):H01L21/30 主分类号 G03F7/20
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