| 摘要 |
PURPOSE:To laminate and form a microlens array directly on a solid-state image pickup element by forming a cross-linking layer on the solid-state image pickup element, shaping a photo-resist pattern on the cross-linking layer and forming irregularities to a resin layer through etching by a gas containing O2 after heat treatment. CONSTITUTION:A layer 7 in which a cross-linking agent containing two or more of hydroxyl groups is added and cross-linked to an organic high molecular layer with epoxy groups is formed onto a solid-state image pickup element containing a color image pickup element, a photo-resist pattern 8 is formed on the layer 7, and irregularities are shaped to said resin layer 7 through dry etching by using a gas containing O2 after heat treatment. Polyglycidyl methacrylate resin to which a substance such as tetrahydroxybenzophenone is added as a cross-linking agent is applied on a solid-state image pickup element substrate to form a lens fixing layer 6 and the microlens layer 7, the mask pattern 8 is formed through heating and cross-linking and the projection of ultraviolet rays, and a microlens- like pattern is shaped through processes such as plasma etching in the gas containing CF4 and O2. |
