| 摘要 |
<p>PURPOSE:To provide satisfactory water resistance, durability and moisture responsiveness and to enable easy control of a film thickness by performing plasma polymn. for basic formation of a moisture sensitive film and introducing a hydrophilic group by a chemical treatment into the resulting plasma-polymerized high polymer film. CONSTITUTION:A resistance type moisture sensor 1 is constituted by forming a pair of film electrodes 3, 3' consisting of thin gold films deposited by evaporation on an insulating base plate 2 consisting of ceramics and coating and forming further a moisture sensitive film 4 consisting of the plasma-polymerized polystyrene introduced therein with a sulfonate group between said electrodes 3 and 3'. The sensor 1 is also constituted by forming a pair of comb-shaped film electrodes 3, 3' consisting of thin gold films deposited by evaporation on the insulating base plate 2 consisting of ceramics and coating and forming the moisture sensitive film 4 consisting of the plasma-polymerized polystyrene introduced therein with the sulfonate group so as to cover the space between the electrodes 3 and 3'.</p> |
