| 摘要 |
PURPOSE:To reduce unnecessary irradiation to a sample to be drawn with a pattern to be generated according to multiple reflections at an electron beam drawing device by a method wherein the surface of the mirror body of the drawing device is covered with a material composed of the element or the compound of a low atomic number (the atomic number is 13 or less). CONSTITUTION:An electron beam 1 radiated from an electron gun is converged to be deflected by a final stage lens 2, and made to enter in a sample 3 to be drawn with a pattern. The reflected electron beam thereof is detected by detectors 9, and used for positional detection of a mark on the sample to be drawn with the pattern. At this time, the part facing to the sample to be drawn with the pattern of the final stage lens 2 is covered with an acrylic resin plate 6 of 0.5mm. thickness adhered with an aluminum film 7 of 100nm thickness, and the aluminum film 7 thereof is earthed electrically by fixing to the final stage lens 2 according to conductive screws 8. Moreover, the holders of the reflected electron beam detectors are also manufactured of acrylic resin 9, the surfaces thereof are covered with aluminum films 10 of 0.1mum thickness, and earthed electrically by fixing mechanically to the final stage lens 2. Accordingly, parasitic irradiation to the sample to be drawn with the pattern according to the electron beam reflected by two times can be reduced to 1/2 or less. |
