| 摘要 |
PURPOSE:To enable reduction of deviation from the set value of the falling angle of interference fringes by specifying a processing soln. high in contraction effect and carrying out the second contraction step. CONSTITUTION:A photosensitive material composed of a polymer contg. an aromatic or hetero ring having a reactive site substitutable by a free radical in each of structural units, and a halogen-contg. compd. dissociable into radical with radiation is exposed to the interference pattern of the radiation. The exposed material is immersed into a swelling soln. to form a pattern, and elute the non-reacted halogen-contg. compd. This swollen material is immersed in a contracting soln. to fix the pattern, the fixed material is further immersed into acetonitrile or methyl isopropyl ketone to apply the second contraction step. As a result, a ratio of the swollen material film thickness 3' to the unexposed photosensitive material film thickness 3 becomes <=110%, and a diffracted light angle obtained on irradiating an incident light on a recording medium is lessened and deviation of it from a set angle 18 deg. is reduced. |
