发明名称 PRODUCTION OF TRANSPARENT ANTIREFLECTION MATERIAL
摘要 PURPOSE:To lower the light reflectance of a transparent substrate having a prescribed refractive index and to enhance the light transmittance by forming a thin organopolysiloxane film having prescribed characteristics on the surface of the transparent substrate in prescribed stages. CONSTITUTION:A thin organopolysiloxane film having 0.01-0.50mum thickness and a refractive index which is lower than that of a transparent substrate by >=0.02 is formed on the surface of the transparent substrate having >=1.52 refractive index in the following stages. The transparent substrate is first spin- coated with a liq. composition contg. an organosilicon compound represented by the formula and/or a hydrolyzate thereof at 25-60 deg.C, and then the coated substrate is heated to cure the liq. composition. Thus, a transparent material having an antireflection property is obtd. In the formula, each of R<1> and R<2> is alkyl, alkenyl, halogen, glycidoxy or hydrocarbon group having cyano, R<3> is 1-8C alkyl or the like, a=0 or 1 and b=0 or 1.
申请公布号 JPS61254901(A) 申请公布日期 1986.11.12
申请号 JP19850095942 申请日期 1985.05.08
申请人 TORAY IND INC 发明人 SEKI TETSUYA;TANIGUCHI TAKASHI
分类号 G02B1/04;G02B1/10;G02B1/11 主分类号 G02B1/04
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