| 摘要 |
Particle cleaning means comprising a particle receiver, a first chamber having an input opening coupled to the particle receiver, a high velocity air stream directed into the first chamber adjacent the input opening for projecting particles into the first chamber for agitated movement under the influence of the air stream, a second chamber coupled to the first chamber through an opening spaced from the input opening, a baffle between the openings to force the particles in a circuitous path through the first chamber, a first suction means coupled to the first chamber and an opposed relation to the air stream and a discharge opening in the lower end of the second chamber, and second suction means coupled to the second chamber and an opposed relation to the second opening and the discharge opening.
|
