| 摘要 |
PURPOSE:To enhance dry etching resistance by using a novolak resin contg. naphthol as a condensing component, as an alkali-soluble resin for use in a 1,2- naphtho-quinonediazide-derived positive type photoresist. CONSTITUTION:A novolak resin is prepared by condensing formaldehyde with a mixture of 40-95mol% alpha-naphthol and 60-5mol% p-cresol. This novolak resin alone or in combination with a cresol novolak resin is mixed with 1,2-naphthoquinone-diazide type compd., such as a triester of 1,2,3-trihydroxybenzophenone and 1,2-naphthoquinone-2-diazido-5-sulfonic acid to obtain an intended positive type photoresist compsn. This compsn. is applied to a substrate, exposed, and developed to form a resist superior in dry etching resistance. |
