发明名称 |
Method for exposure dose calculation of photolithography projection printers. |
摘要 |
<p>A process for setting the exposure speed of photolithography instruments is described, using a method of dosimetry based on photoactive compound bleaching of photoresist. A curve of light absorbance to exposure speed and a calibration curve of light absorbance to dose are determined for a photoresist. The exposure speed for any desired degree of resist bleaching can be set using the first curve, and the exposure speed for a predetermined dosage can be set by determining the common light absorbance value on the exposure speed and dosage curves.</p> |
申请公布号 |
EP0134453(A2) |
申请公布日期 |
1985.03.20 |
申请号 |
EP19840107434 |
申请日期 |
1984.06.28 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
CHOW, MING-FEA;LOPATA, ALEXANDER DANIEL;LYONS, CHRISTOPHER FRANCIS;MCINTOSH, ROBERT CHARLES;SCADUTO, ANTHONY FRANCIS |
分类号 |
H01L21/30;G03C5/08;G03F7/105;G03F7/20;(IPC1-7):G03B41/00 |
主分类号 |
H01L21/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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