| 摘要 |
PURPOSE:To enlarge a positioning allowance degree of an ion implantation pattern and a ''Permalloy'' pattern by making the joining direction of both the patterns uniform in the same direction. CONSTITUTION:A minor loop 12 is a prescribed bend pattern, and plural joining parts of an ion implantation pattern 13 and a ''Permalloy'' pattern 14 are made uniform so that the respective joining directions of the same kind such as the joining direction of joining parts 1, 3 to the pattern 13 from the pattern 14, the joining direction of joining parts 2, 4 to the pattern 14 from the pattern 13, etc. become the same. Accordingly, as if the pattern 14 is shifted a little in the vertical direction to major lines 10, 11, etc., a relative relation of the patterns 13, 14 becomes the same. As a result, a positioning allowance degree of the ion implantation pattern and the ''Permalloy'' pattern becomes large. |
