| 摘要 |
PURPOSE:To decrease cleaning spots in a implanting room and to make the cleaning process to be performed in a short time by capturing dusts generated in the implanting room at determined spots. CONSTITUTION:An implanting room is designed to open separately into two portions namely an implanting room fixed side 1 and an implanting room movable side 2 to carry into and carry out wafers. An ion beam is introduced into the implanting room through a window 6 and irradiates wafers. Dusts spattered from the wafer 5 irradiated by the ion beam and from the vicinity thereof go straight at various angles and scatter. A filter 7 to capture the dusts is disposed facing to the vicinity of the wafers irradiated by the ion, and by installing capturing plates 8 of the filter 7 at an uniform level or multistages, dusts scattered in various directions are captured. Also, the filter 7 is maintained at a negative potential against the shooting room fixed side 1 from outside, and by adsorbing particles charged positively by electrostatic force, capturing effect can be raised further. |
