| 发明名称 |
ADHESION OF A PHOTORESIST TO A SUBSTRATE |
| 摘要 |
<p>A process for improving the adhesion of a photoresist to a substrate by applying a layer of titanium, zirconium, hafnium and/or oxide thereof between the photoresist and substrate.</p> |
| 申请公布号 |
CA1184321(A) |
申请公布日期 |
1985.03.19 |
| 申请号 |
CA19820399153 |
申请日期 |
1982.03.23 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
MARINACE, JOHN C.;MCGIBBON, RALPH C. |
| 分类号 |
G03F7/09;G03F7/11;H01L21/312;(IPC1-7):H01L21/312;G03F7/02 |
主分类号 |
G03F7/09 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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