X-ray lithography apparatus

摘要

An x-ray lithography apparatus consists of an x-ray tube which is designed to generate long-wave x-rays and comprises an electron gun consisting of a thermionic cathode and a grid, an electron-beam deflection and focusing device and a target made of a material with high order number and high melting point. The apparatus also consists of a support for the substrate to be exposed to x-rays and also a support for the lithography mask. For industrial application, it is rendered capable of achieving adequate intensities with short exposure times as a result of the fact that, in the x-ray tube, use is made of an electron gun in which the grid has, on its side facing the target, an inwardly directed flange which encloses the opening in which the tip of the thermionic cathode is situated. In the gun, the side of the flange facing the thermionic cathode is flat or is bent in the direction of the thermionic cathode. The side of the flange facing the target extends at an angle beta of 100 DEG to 140 DEG in the direction of the tip of the thermionic cathode. The material of the flange tapers at an angle alpha of 15 to 60 DEG C in the direction of the rim forming the boundary of the central opening. The suitability of the apparatus is also due to the fact that the focal spot on the target has a diameter of less than 10<-4> m, that the spacing between the target and the x-ray exit window of the x-ray tube is not more than 2.10<-2> m, and that the spacing ... Original abstract incomplete.