| 摘要 |
PURPOSE:To use a device of a wafer line prepared basing on a roughly circular wafer as a reference, and to automate easily a process by forming a glass mask in a roughly circular shape. CONSTITUTION:A prescribed pattern Z is formed on a circular glass plate 1. Also, a fact 3 formed by cutting a part of the circumference is provided in order to position easily a glass mask in case of an exposing work. As for such a facet, plural pieces can be provided on an optional part. The glass mask can be used for both negative and positive. |
