发明名称 MASKING SUBSTRATE
摘要 PURPOSE:To attain electron beam drawing under the state that the metallic layer of only a recessed part is exposed to the surface, to maintain stable contact between an earth pin and a metallic layer and to attain precise electron beam drawing by forming at least one or more recessed parts on the surface of a masking substrate. CONSTITUTION:A notched part 2 is formed on a part of one side out of four sides of the peripheral edge part of the masking substrate 1 so that the section of the notched part is inclined by cutting off quartz glass e.g. like a plat and notching a prescribed position of its peripheral edge. A chromium or the like is adhered to the surface of the masking substrate 1 by an evaporation or sputtering method to form a metallic layer 3, the metallic layer 3 is also formed on the notched surface 2a of the notched part 2 and a resist layer 4 consisting of polymer resin or the like is formed on the surface of the metallic layer 3. The masking substrate 1 on which respective layers 3, 4 are formed is loaded to a masking substrate holding tool 5, and then an earth pin 9 is fitted from the inside surface so as to be projected in the horizontal direction.
申请公布号 JPS61262741(A) 申请公布日期 1986.11.20
申请号 JP19850103724 申请日期 1985.05.17
申请人 HITACHI LTD 发明人 HOKO MORIHISA
分类号 G03F1/00;G03F1/60;H01L21/027 主分类号 G03F1/00
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