| 摘要 |
PURPOSE:To obtain low expansion glass easy to melt, inhibiting bubble from entering, having superior heat resistance, thermal shock resistance and chemical durability, and suitable for use as glass for a substrate for a photomask or the like by blending SiO2 with Al2O3, CaO, B2O3, ZnO, etc. CONSTITUTION:This low expansion glass contains, by weight, 55-65% SiO2, 10-20% Al2O3, 2-10% B2O3, 3-10% MgO, 1-8% CaO, 2-10% ZnO, 0-4% R2O (R is an alkali metal) and 0-4% ZrO2. The glass has a low expansion coefft., a low softening point, a low devitrification temp. and a relatively low melting temp., so the glass is easily melted, inhibits bubbles from entering, and has superior heat resistance, thermal shock resistance and chemical durability. The glass is suitable for use as glass for a substrate for electronics such as a substrate for a photomask, a display or a solar cell. |
