METHOD FOR WASHING PHOTOMASK

摘要

PURPOSE:To remove contaminants without affecting the light intercepting film of a pattern and without eluting Cr or Cr oxide by carrying out an oxygen plasma treatment process and then carrying out an ultrasonic treatment process in pure water. CONSTITUTION:A photomask is subjected to oxygen plasma treatment to remove its org. contaminants and further subjected to ultrasonic treatment in pure water to remove its inorg. contaminants. Finally, it is dried to remove the pure water.