| 摘要 |
PURPOSE:To improve the yield of a substrate and to make reutilization of a mask by forming a protective film on the hard mask, bringing the same into tight contact with the substrate and subjecting the substrate to contact exposing. CONSTITUTION:The surface of a mask 22 in contact with a substrate 21 is coated with an org. solvent, for example, hexamethylene disilazane (HMDS), etc. and is thus protected. Since the HMDS is a volatile solvent, a thin (200Angstrom ) transmittable film is formed at a room temp. The resist layer 24 of the substrate 21 is prevented from sticking to the mask 22 by the protective film 23 formed in such a way. The protective HMDS film is formed in the following way: A carrier 25' contg. the plural masks 22 is disposed in a vessel 25 consisting of quartz glass, etc. in which an HMDS soln. 26 is filled. The vessel is then hermetically sealed with a cap 28. The masks 22 heated at about 50 deg.C by a heater 29 are exposed for 5-30min to the gaseous atmosphere and are then naturally dried, by which the desired protective film 23 is obtd. The resist layer on the substrate is thus prevented from peeling therefrom and sticking to the surface of the mask 22. |
