| 摘要 |
PURPOSE:To enable to detect the a foreign substance present on the material to be processed by a method wherein the secondary electron generating from the material to be processed when an electron beam is made to irradiate is picked up. CONSTITUTION:The electron beam 2 made to irradiate from an electron gun 1 is focussed by an electron lens 3 and reaches the material to be processed. Said electron beam is deflected by a deflection magnetic pole 4, and the desired part of the material to be processed 5 is exposed. At this time, as a foreign substance such as dust and the like is present on the material to be processed and the electron beam resist located on the material to be processed 5 is flat ordinarily when an electron beam is made to irradiate on the foreign substance, the signal of the secondary electron to be generated is changed, and the presence of dust whereon the electron beam 2 is made to irradiate can be recognized by detecting the foreign substance by the secondary electron detecting machine 6. |
