| 摘要 |
<p>A thin film and method of making the same involving a film (11) in which pinholes (17, 18, 19) in the film are plugged with insoluble photoresist material (21). The film (11) is substantially opaque to the light wavelength range causing said photoresist material to become insoluble. The method for making such thin film involves coating said thin film (11) on one side with a layer of insulating photoresist material so that a substantial portion of substantially all of the pinholes (17, 18, 19) are filled and then exposing the other side of the film to the light wavelength range causing said photoresist material to become insoluble.</p> |
