| 摘要 |
PURPOSE:To obtain an amorphous magnetic alloy with high satd. magnetic flux density and high magnetic permeability by carrying out deposition while applying a rotating magnetic field to the surface of a substrate when an amorphous magnetic alloy whose crystallization temp. is below the magnetic Curie temp. is sputtered. CONSTITUTION:A composite target 14 having a stuck amorphous magnetic alloy whose crystallization temp. is below the magnetic Curie temp. and each substrate 15 on which an amorphous magnetic alloy film is deposited are placed in a high frequency sputtering apparatus. The substrate 15 is rotated in the direction of an arrow 17, and while relatively applying a rotating magnetic field to the surface of the substrate 15 with electromagnets 18, 18' placed at the outside of the apparatus, an amorphous magnetic alloy film is deposited on the substrate 15. |
