发明名称 PROJECTING AND EXPOSING DEVICE
摘要 PURPOSE:To obtain the projecting and exposing device with which a refrection mirror can be maintained in high degree of mirror face accuracy even after an assembling work has been finished and that a mask pattern can be image-formed on a wafer with a high degree of resolution. CONSTITUTION:A concave mirror 5 is disc-shaped and it is thick at the edge part and thin in the center part, and it is arranged on the inner circumferential part of a ring- shaped frame body which is used as a supporting means. At a plurality of places on the inner circumferential side face of said concave mirror 5 which is mentioned below, a groove 20 is provided and a bank part 21 is formed between the groove 20 and the back side of the concave mirror 5. Said concave mirror 5 is arranged at the prescribed position of the frame body 23 before a block 24 is inserted. Subsequently, the block 24 is inserted, and it is fitted to the groove 20 of the concave mirror 5. As the bulge of the block 24 is pressure-welded to the metal snap 22 of the bank part 21, the bank part 21 is pinched between the block 24 and another block 26. Also, as the bolt 27 to be used for adjustment which is screwed into the screw hole is contacted to the metal snap located at the bottom of the groove 20, the concave mirror 5 is fixed to the circumferential direction, and it is supported by the frame body 23.
申请公布号 JPS6038819(A) 申请公布日期 1985.02.28
申请号 JP19830146360 申请日期 1983.08.12
申请人 HITACHI SEISAKUSHO KK 发明人 TANAKA TSUTOMU;IKEDA MINORU;OSHIDA YOSHISADA
分类号 H01L21/30;G03F7/20;H01L21/027;(IPC1-7):H01L21/30 主分类号 H01L21/30
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